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1 - MAXIS 300L ICP ICP Etcher MAXIS 300L ICP Etcher, 2011 FACILITY ; CDA : size(3/8") (4~6 ㎏/㎠) He : size(1/4") (1~2 ㎏/㎠)PCW(IN) : size(1/2") (≥4 ㎏/㎠) PCW(OUT) : size(1/2") (≤1...
Semi Materials - Korea
1 - TAINICS TE3100 ICP Etcher TAINICS TE3100 ICP Etcher (for GaN etching), 2011 2" Wafer No/Tray : 20pcs 4"wafer No/Tray : 5pcs Gas : Cl2 based Cleaning Gas : CF4, O2 Selectivity : ≥0.8 at PR Non Uniformity (%nu) :...
Semi Materials - Korea
1 - Nikon NSR-1755i7 Stepper Nikon NSR-1755i7 Stepper, 1992 (refurbished 2011) Reticle Size : 5Inch × 5Inch Thickness : 0.09Inch Material : Quartz glass or low-expansion glass Type : Low-reflection chromium mask...
Semi Materials - Korea
1 - QMC PLS-600 Pellucid Laser Scriber QMC PLS-600 Pellucid Laser scribing system, 2011 ​Wafer size(inch) : Up to 6 inch Scribing Speed : 450mm/sec(max) Wafer cassette : 25ea System dimension(mm) :...
Semi Materials - Korea
1 - ScanPlus Model P-6 Stepper Alpha Step Maker ScanPlus Model P-6 Acquisition Date 2011-05-20 Q’ty 1 EA Stylus Profiling Step Height Repeatability Apex Software Productivity Package 3D Imaging 2D Stress Analysis Offline...
Semi Materials - Korea
1 - SNTEK Model PSA5000 Asher Asher Maker SNTEK Model PSA5000 Acquisition Date 2011-06-08 Q’ty 1 EA Substrate Size : 2″(326cs) Wafer Source : PE Plasma Type Ashing Rate : Various Ashing Uniformity : ≤±10%
Semi Materials - Korea
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